Electrophysical properties of epitaxial gallium arsenide doped with acceptor impurities

Epitaxial layers of gallium arsenide doped with zinc and cadmium were grown in a chloride vapor-transport system using diethylzinc and dimethylcadmium as the sources of the impurity. We studied the effect of the inlet pressure of the impurities and the growth temperature on the doping level of the layers. We investigated the temperature dependences of the hole concentration and mobility in layers doped with zinc and cadmium up to different levels.