Photochemical vapor deposition of mixed-metal thin films from organometallic precursors containing heteronuclear metal-metal bonds

Abstract Thin films of iron-cobalt and iron-nickel have been prepared by a low-temperature photochemical vapor deposition technique using organometallic precursors containing heteronuclear metal-metal bonds. The stoichiometries of the metals can be retained in the deposited films provided that no extensive thermal decomposition of the precursors occurs during the vaporization process.