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Atmospheric Pressure Chemical Vapor Deposition of In-Situ Doped Amorphous Silicon Layers for Passivating Contacts
Atmospheric Pressure Chemical Vapor Deposition of In-Situ Doped Amorphous Silicon Layers for Passivating Contacts
2018
Robby Peibst
Rolf Brendel
Barbara Terheiden
J. Steffens
Byungsul Min
H. Knauss
S. Seren
Agnes Merkle
Keywords:
Chemical vapor deposition
Amorphous silicon
Chemical engineering
Crystallite
Doping
Atmospheric pressure
Materials science
In situ
atmospheric pressure chemical vapor deposition
Correction
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