Ambipolar diffusion anisotropy induced by defects in nipi‐doped In0.2Ga0.8As/GaAs multiple quantum wells

The influence of strain‐induced defects on the ambipolar diffusive transport of excess electrons and holes in the δ‐doped InGaAs/GaAs multiple quantum well system has been examined with a new technique called electron‐beam‐induced absorption modulation (EBIA). The excess carrier lifetime and diffusion coefficient are obtained by a one‐dimensional diffusion experiment that utilizes EBIA. An anisotropy in the ambipolar diffusion along both high‐symmetry 〈110〉 directions is found, and this is seen to correlate with the distribution of dark line defects observed in cathodoluminescence.