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Characteristics of Al2O3 Films Deposited by Plasma-Assisted Atomic Layer Deposition with Varying RF Powers
Characteristics of Al2O3 Films Deposited by Plasma-Assisted Atomic Layer Deposition with Varying RF Powers
2018
Kyoung Cheol Shin
Kwan Hong Min
Sung-jin Choi
Myeong Sang Jeong
Jeong In Lee
Hee-eun Song
Donghwan Kim
Min Gu Kang
Keywords:
Plasma
Optoelectronics
Atomic layer deposition
Chemistry
Correction
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