Определение твердости и модуля упругости тонких пленок Ti и TiO2

The hardness and elastic modulus of thin Ti and TiO2 films on a Si substrate are measured by nanoindentation. It is shown that the Oliver-Pharr method in combination with a method of calculating the true film hardness allows one to correctly determine the hardness of thin films deposited on the substrate, independently of the hardness ratio between the film and substrate.