Plasmochemical Deposition of an Ultrathin (CFx)n Film

We present ultrathin teflon-like (CFx)n antiadhesive polymer films, deposited on silicon an polyethylentereftalate (PETF) surfaces by CF4 and C3F8 microwave discharge. The film growth phenomenon was reached by changing F/C ratio of the monomer. X-ray photoelectron spectroscopy analysis shows that polymer film presents as -CF2-CF2- junctions. Increasing deposition time, fluorinated film on PETF become ultrathin teflon-like polymer film and surface energy decreases to 42 mJ/m2.