Self-Assembled c-Plane GaN Nanopillars on γ-LiAlO2 Substrate Grown by Plasma-Assisted Molecular-Beam Epitaxy

We have grown M-plane GaN films with self-assembled C-plane GaN nanopillars on a γ-LiAlO2 substrate by plasma-assisted molecular-beam epitaxy. The diameters of the basal plane of the nanopillars are about 200 to 900 nm and the height is up to 600 nm. The formation of self-assembled c-plane GaN nanopillars is through nucleation on hexagonal anionic bases of γ-LiAlO2. Dislocation defects were observed and analyzed by transmission electron microscopy. From the experimental results, we developed a mechanism underlying the simultaneous growth of three-dimensional c-plane nanopillars and two-dimensional M-plane films on a γ-LiAlO2 substrate.