Neutral Beam Source Design and Beam Kinetic Energy Activated SiO 2 Etching

An unique method is used to produce a low energy nonthermalized fast neutral radical beam wliich can activate the SiO2 surface for chemical reaction at the desired incident energy. The fast neutral beam energy is continuously adjustable (2eV

Keywords:

• Ion beam
• Reactive-ion etching
• Etching
• Atomic physics
• Beam (structure)
• Materials science
• Kinetic energy
• Analytical chemistry
• beam source

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