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Universal surface reaction model of plasma oxide etching
Universal surface reaction model of plasma oxide etching
2020
Hae Sung You
Yeong-Geun Yook
Won Seok Chang
Jae-Hyeong Park
Min Ju Oh
Deuk-Chul Kwon
Jung-Sik Yoon
Dong-Hun Yu
Hyoungcheol Kwon
Sung Kye Park
Yeon Ho Im
Keywords:
Plasma
surface reaction
Analytical chemistry
Oxide
Etching
Physics
Correction
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