Photocatalytic properties of TiO2 films prepared by bipolar pulsed magnetron sputtering

Abstract TiO 2 thin films were deposited by the bipolar pulsed magnetron sputtering of a Ti target at low working pressure (1 mTorr) and various Ar and O 2 flow ratios. (The Ar flow rate was fixed at 30 sccm.) The effects of the Cr implantation fluence on the crystal structure, surface microstructure, and optical and photocatalytic properties of Cr-implanted TiO 2 films were investigated. The structure and composition of the films were characterized by grazing-incidence X-ray diffraction and X-ray photoelectron spectroscopy. The surface morphology of the films was characterized by field emission scanning electron microscopy. The optical properties were determined by UV–VIS transmission spectroscopy. The photocatalytic properties of the films were analyzed by the de-colorization of methylene blue with UV and visible light. Experimental results show that the implantation of a moderate amount of Cr with a fluence of 5 × 10 15 in the TiO 2 film preserves the anatase crystal structure and modifies the film in a manner that favors its photocatalytic properties.