Process chamber and method of use thereof have a common resource

Process chamber and method of use thereof have a common resource is provided. In some embodiments, the substrate processing system, a first process chamber having a first substrate support disposed in the first process chamber, a first substrate support first substrate in a second process chamber having a first process chamber having a first heater and the first cooling plate for controlling the temperature of the support, the second substrate support disposed in the second process chamber there, the second substrate support and the second process chamber having a second heater and a second cooling plate for controlling the temperature of the second substrate support, a first cooling plate and a second cooling plate containing an outlet supplying a heat transfer fluid, and a first cooling plate and a common heat transfer fluid source having an inlet for receiving the heat transfer fluid from the second cooling plate.