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Highly Manufacturable CMOSFETs with Single High-k (HfLaO) and Dual Metal Gate Integration Process
Highly Manufacturable CMOSFETs with Single High-k (HfLaO) and Dual Metal Gate Integration Process
2007
X.P. Wang
M. F. Li
H.Y. Yu
J.-J. Yang
C. Zhu
W S Hwang
Wei Yip Loh
A.Y. Du
Jingde Chen
Albert Chin
S. Biesemans
Guo-Qiang Lo
Dim-Lee Kwong
Keywords:
Metal gate
Nanotechnology
High-κ dielectric
Electronic engineering
Materials science
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