Semi-conductor substrate and manufacture method thereof

A semi-conductor substrate and a manufacture method thereof are disclosed. The manufacture method comprises the following steps: a semi-conductor substrate is provided and has a plurality of deep grooves, a plurality of insulating structures are formed on the semi-conductor substrate, each insulating structure is provided with an isolating part and a protruding part, the isolating parts is arranged in the deep grooves, the protruding parts are positioned on the isolating parts, overflow parts of the protruding parts cover the semi-conductor substrate, a bit line zone is delimited between two neighboring protruding parts, a sacrificial layer is formed to cover the protruding parts and the bit line zones, the sacrificial layer is provided with a plurality of openings, and a plurality of shielding structures are formed in the openings; the shielding structure are used as automatic aligning cover curtains, part of the sacrificial layer and part of the semi-conductor are selectively removed, two bit line grooves can be formed in each bit line zone, and therefore utilization of portable photomasks can be reduced.