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Acemap > Paper > Plasma Parameters in an Ar and Ar/Cl$_{\mathrm{2\thinspace }}$Asymmetric Coaxial CCP Used for Plasma Etching of Superconducting Niobium Cavities.

Plasma Parameters in an Ar and Ar/Cl$_{\mathrm{2\thinspace }}$Asymmetric Coaxial CCP Used for Plasma Etching of Superconducting Niobium Cavities.

2018 
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