Analysis and inhibition of progressive photomask contamination in long‐term use for liquid‐crystal panel production
2010
— Progressive contamination on photomasks has become a serious concern as a source of defects in long-term TFT-LCD manufacturing. The chemical structure and mechanism of formation of such contamination was determined, an accelerated test to replicate it was devised, and a means of inhibiting it was developed.
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
8
References
1
Citations
NaN
KQI