Nitrogen-ion-implanted planar optical waveguides in Er-doped tellurite glass: Fabrication and characterization
2008
Fabrication of channel waveguides in Er-doped tungsten-tellurite glasses was recently demonstrated. In order to get a
deeper understanding of the process and to optimize the characteristics of the waveguides, we fabricated a set of planar
waveguides, each of 7 mm × 7 mm lateral dimensions, in an Er-doped tellurite glass sample by implantation of 1.5 MeV
nitrogen ions. Doses of the implanting ions ranged from 1 · 10 16 to 8 · 10 16 ions/cm 2 . The samples were studied using
interference phase contrast microscopy (Interphako), m-line spectroscopy and spectroscopic ellipsometry. The results
show that a barrier layer of reduced refractive index was created around the range of the implanted ions at every dose. It
is hoped that combination of the results obtained in these experiments with simulations for channel waveguides will
make it possible to optimize ion-implanted fabrication of integrated optical components in this tellurite glass.
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