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Vapor phase doping for ultra shallow junction formation in advanced Si CMOS devices
Vapor phase doping for ultra shallow junction formation in advanced Si CMOS devices
2010
Yasuo Shimizu
Ngoc Duy Nguyen
Sijia Jiang
Erik Rosseel
Shotaro Takeuchi
Jean-Luc Everaert
Roger Loo
Wilfried Vandervorst
Matty Caymax
Keywords:
Electronic engineering
Doping
CMOS
Materials science
vapor phase
Optoelectronics
shallow junction
Correction
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