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Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties
Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties
2011
H. Wojcik
Marcel Junige
W. Bartha
M. Albert
Volker Neumann
U. Merkel
Anita Peeva
J. Gluch
Siegfried Menzel
F. Munnik
R. Liske
D. Utess
Inka Richter
Christoph Klein
Hans-Jürgen Engelmann
Paul S. Ho
Christoph Hossbach
C. Wenzel
Keywords:
Plasma-enhanced chemical vapor deposition
Ruthenium
Chemistry
Inorganic chemistry
Correction
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