Old Web
English
Sign In
Acemap
>
Paper
>
Quantum chemical investigation for Chemical dry etching by flowing NF$_{3 }$into H$_{2}$ down flow plasma
Quantum chemical investigation for Chemical dry etching by flowing NF$_{3 }$into H$_{2}$ down flow plasma
2011
Toshio Hayashi
Kenji Ishikawa
Makoto Sekine
Masaru Hori
Akihiro Kono
Koukou Suu
Keywords:
Plasma
Dry etching
Chemistry
Inorganic chemistry
Analytical chemistry
Flow (psychology)
Materials science
quantum chemical
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]