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(Invited) Development of New High-Dielectric Constant Thin Film Materials for Next-Generation Nanoelectronics
(Invited) Development of New High-Dielectric Constant Thin Film Materials for Next-Generation Nanoelectronics
2016
Takahiro Nagata
Somu Kumaragurubaran
Kenichiro Takahashi
Sung-Gi Ri
Yoshifumi Tsunekawa
Setsu Suzuki
Toyohiro Chikyow
Keywords:
Thin film
High-κ dielectric
Electronic engineering
Arithmetic
Nanoelectronics
Materials science
Optoelectronics
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