Field enhanced inductively coupled plasma (fe-icp) reactor

Embodiment of a field enhanced inductively coupled plasma reactor and its usage are provided herein. In some embodiments, a field enhanced inductively coupled plasma processing system may include a process chamber having a plasma source assembly disposed above the dielectric lid and dielectric lid. RF for plasma source assembly, which forms in the process chamber and one or more coils configured to inductively couple RF power to maintain by forming a plasma in the process chamber, a plasma into the process chamber configured for capacitive coupling power into the process chamber, is coupled to one or more electrodes and one or more inductive coils and one or more electrodes are electrically coupled to one of the one or more coils and a RF generator. In some embodiments, the heater element may be disposed between the dielectric lid and the plasma source assembly.