The method of forming a pattern

Example of a method of forming the substrate comprises forming a pattern base layer and overlying the intermediate layer on the substrate. The photoresist pattern is formed on the intermediate layer. A coating deposited on the resist pattern is etched. The etched photoresist pattern used as a mask and the coating member to the at least one patterned intermediate layer and the bottom layer. At least one element as a mask the underlying patterned intermediate layer and patterned in the substrate by etching the substrate to form a pattern. Pattern coverage measurement process may be used as the substrate elements.