Lithography lens Array Fby Laser I Micro

Micro-lens array (MLA) is a useful optic component. In this paper, we present a method to fabricate the MLA by three-beam laser interference lithography (LIL). Large area MLAs were obtained on photoresist. The MLA feature size was determined by controlling the incident angle of laser beams in LIL. The curvature of MLA was modified through the control of the post bake temperature and time or exposure dosage in LIL. It is convenient to adjust the size of the MLA in the laser interference lithography system. This method has the advantage of large area fabrication.