As-Deposited Superconducting Thin Films by Electron Cyclotron Resonance-Assisted Laser Ablation for Application in Micro-Electronics
1991
A method for the growth of as-deposited superconducting thin films which combines YAG-laser ablation and oxidation by an electron cyclotron resonance (ECR)-excited oxygen plasma is described. It is demonstrated by depositions on YSZ and SrTiO3 substrates that this one-step method is compatible with the requirements of large surface homogeneity, low substrate temperature and low oxygen partial pressure. The method is therefore well suited for applications in micro-electronics.
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