High‐energy lithography illumination by Oxford’s synchrotron: A compact superconducting synchrotron x‐ray source

Successful results on a development scale have demonstrated the benefits of x‐ray lithography for producing fine features with broad process latitude. This paper is concerned with design of an x‐ray source appropriate for production scale utilization of this technology. General considerations of throughput required show that, regardless of type, the source must provide several kilowatts of continuous x‐ray power. At present, only synchrotrons can achieve this level. Conventional synchrotrons are too large for installation in a wafer fabrication facility, but superconducting synchrotrons can be relatively compact. Oxford Instruments Ltd. are presently building high‐energy lithography illumination by Oxford’s synchrotron (HELIOS), a compact superconducting synchrotron, for installation in the IBM Advanced Lithography Facility at East Fishkill, New York. HELIOS will produce over 8 kW of continuous x‐ray power with a characteristic critical wavelength of 0.84 nm. The design and performance of HELIOS are descr...