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XPS In-Depth Profiles of Native-Oxide/P-Doped-Si Obtained by Chemical Etching
XPS In-Depth Profiles of Native-Oxide/P-Doped-Si Obtained by Chemical Etching
1997
Wen Biao Ying
Yusuke Mizokawa
Akito Konishi
Michiyo Yamamoto
Katsuto Tanahashi
Yoshitomo Kamiura
Makio Iida
Kazunori Kawamoto
Wei Yi Yang
Keywords:
Oxide
Isotropic etching
Doping
Analytical chemistry
X-ray photoelectron spectroscopy
Chemistry
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