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Patterning Characteristics of $\bf 0.1\mbox{-}\mbi{\mu}m$ Line-and-Space Pattern in Synchrotron Radiation Lithography
Patterning Characteristics of $\bf 0.1\mbox{-}\mbi{\mu}m$ Line-and-Space Pattern in Synchrotron Radiation Lithography
1994
Yoh Somemura
Kimiyoshi Deguchi
Kazunori Miyoshi
Keywords:
Optics
Synchrotron radiation
Physics
Nuclear magnetic resonance
Lithography
Correction
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