The synthesis and characterization of novel 2‐nitrobenzyl sulfonate photo‐generators of acid

Methodology was developed for the synthesis of novel 2-substituted o-nitrobenzyl chromophores, which were derivatized as the tosylate esters. The thermal stabilities of these new tosylates fell within the rangee predicted from an empirical model. Lithographic sensitivities of deep UV resists made from these new esters and poly(4-(tert-butoxycarbonyloxy)styrene-sulfone) ranged from 45 to 90 mJ/cm 2