Production of Silicon Nanocrystals by Thermal Annealing of Silicon-Oxygen and Silicon-Oxygen-Carbon Alloys: Model Systems for Chemical and Structural Relaxation at Si-SiO 2 and Sic-SiO 2 Interfaces

This paper discusses the formation of silicon nanocrystals, nc-Si, by thermal annealing of hydrogenated amorphous thin films of SiOx, x<2 and (Si, C)Ox, x<2. Comparisons are made with SiCx films, providing additional insights into pathways for generation of nc-Si. These alloys are used as model systems for understanding chemical and structural relaxations occurring at Si-SiO2 and SiC-SiO2 interfaces during post-oxidation thermal annealing. This then provides important information for optimized processing of Si-SiO2 and SiC-SiO2 interfaces for device applications.