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Hybrid functional IrO2-TiO2 thin film resistor prepared by atomic layer deposition for thermal inkjet printheads
Hybrid functional IrO2-TiO2 thin film resistor prepared by atomic layer deposition for thermal inkjet printheads
2011
Won-Sub
Kwack
Hyoung-Seok
Moon
Seong Jun
Jeong
Qi Min
Wang
Se-Hun
Kwon
Keywords:
Hybrid functional
Materials science
Resistor
Thin film
Atomic layer deposition
Optoelectronics
Thermal
Correction
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