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Fabrication of a high uniformity Mo/Si multilayer with a diameter of 120 mm using magnetron sputtering technology
Fabrication of a high uniformity Mo/Si multilayer with a diameter of 120 mm using magnetron sputtering technology
2010
潘磊 Pan Lei
王晓强 Wang Xiaoqiang
张众 Zhang Zhong
朱京涛 Zhu Jingtao
王占山 Wang Zhangshan
李乙洲 Li Yizhou
李宏杰 Li Hongjie
王道荣 Wang Daorong
赵巨岩 Zhao Juyan
陆伟 Lu Wei
Keywords:
Sputter deposition
Nuclear magnetic resonance
Physics
Fabrication
Optics
Optoelectronics
Correction
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