Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings

Marta Januś,Karol Kyzioł,S. Kluska,J. Konefał-Góral,A. Małek,S. Jonas

Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings

2015

Marta Januś
Karol Kyzioł
S. Kluska
J. Konefał-Góral
A. Małek
S. Jonas

This work has been supported by the statutory research of Department of Physical Chemistry and Modeling of Faculty of Materials Science and Ceramics AGH (subject number 11.11.160.257).

Keywords:

Metallurgy
Chemical vapor deposition
Composite material
Materials science
Plasma
Titanium
Ceramic
technological design
industrial chemistry
materials processing

Correction
Source
Cite
Save
Machine Reading By IdeaReader

References

Citations