Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure
1999
A precision laser pattern generator for writing arbitrary
diffractive elements was developed as an alternative to Cartesian
coordinate laser/electron-beam writers. This system allows for
the fabrication of concentric continuous-relief and arbitrary binary
patterns with minimum feature sizes of less than 0.6 µm and
position accuracy of 0.1 µm over 300-mm substrates. Two
resistless technologies of writing on chromium and on amorphous silicon
films were developed and implemented. We investigated limit
characteristics by writing special test structures. A 58-mm
f/1.1 zone plate written directly is demonstrated at a
λ/50 rms wave-front error corresponding to a 0.06-µm
pattern accuracy. Several examples of fabricated diffractive
elements are presented.
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