Development of the Cat-CVD apparatus and its feasibility for mass production

Key issues in the development of the catalytic chemical vapor deposition (Cat-CVD) apparatus for mass production were discussed. Particularly, issues such as suppression of metal impurity contamination, control of substrate temperature independent of heat radiation from the catalyzer, arrangement and attachment of catalyzer, geometrical layout of the catalyzers for uniform distribution of film thickness, and in situ cleaning methods were discussed for the purpose of developing the apparatus. In addition, practical measures for each issue were demonstrated and their feasibility for mass production were briefly mentioned.