Spectroscopic ellipsometry of a-Si/SiO2 large waveband coating for the JWST-FGS-TFI etalon plates fabrication
2010
Previous publications for the JWST-FGS-TFI instrument described the design and fabrication of mirror coatings for
scanning Fabry-Perot etalons. Since that time, we have extended the fabrication process using ellipsometry analysis over
the full operational bandwidth from 1.0 to 5.0 microns for both mirror and anti-reflection coatings. This paper will
present single and multiple layer ellipsometry analysis of the a-Si/SiO 2 optical properties. Analysis improvement came
from a-Si/SiO 2 interface consideration and simultaneous use of ellipsometric data from Woollam V-VASE and IRVASE
instruments. Simulations of reflectance and transmittance based on the ellipsometric analysis results will also be
compared to spectrophotometric measurements for witness pieces.
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