Oxide Heterogrowth on Ion-exfoliated Thin-film Complex Oxide Substrates

Abstract Fabrication of a bilayer HfO 2 /single-crystal LiNbO 3 film is demonstrated using deep high-energy He + implantation in a LiNbO 3 wafer, followed by HfO 2 atomic layer deposition, and, then, selective etching exfoliation from the bulk LiNbO 3 crystal. The properties and morphology of these exfoliated bilayer films are characterized using a set of thin-film probes. Pre-exfoliation film patterning and one model application, in surface-refractive-index tuning of guided waves in a free-standing LiNbO 3 film, are also demonstrated.