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Comprehensive Study and Atomic Layer Deposition of HfO2 Process Development Using Novel Hf Alkoxide Precursors
Comprehensive Study and Atomic Layer Deposition of HfO2 Process Development Using Novel Hf Alkoxide Precursors
2020
Hwi Yoon
Ga Yeon Lee
Yujin Lee
Seunggi Seo
SangHun Lee
Taewook Nam
Sungmin Park
Sang-Yoon Lee
Bo Keun Park
Taek Mo Chung
Hyungjun Kim
Keywords:
Alkoxide
Atomic layer deposition
Chemical engineering
Materials science
process development
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