Epitaxial MnO thin films grown by pulsed laser deposition

Abstract By using pulsed laser deposition under vacuum from Mn 2 O 3 targets epitaxial MnO thin films have been grown. The substrates used were sapphire [001] and MgO [111]. Best results were achieved at a pressure of 10 −4 mbar and at substrate temperatures of 700°C. The films were characterised by using grazing incidence X-ray scattering as well as θ –2 θ Bragg scattering. Part of the characterisation was done with synchrotron radiation at beamline ID20 of the ESRF/Grenoble. The films show lattice parameters close to the bulk ones. The growth direction was found to be [111]. RBS measurements were used to check interdiffusion and film thickness. Typical film thicknesses were from 200 A up to 3500 A . These films have been studied by magnetic X-ray scattering experiments at the ESRF. They exhibit antiferromagnetic long range order similar to bulk crystals.