Equilibrium of dissolving species in aqueous H2SiF6 solution during the liquid phase deposition reaction

The equilibrium reaction of H 2 SiF 6 solution in the LPD method was investigated by the measurement of UV and IR spectroscopies, vapor pressure and electric conductivity. These measurements were carried out by adding the F - scavenger such as H 3 BO 3 and Al metal which shifts the equilibrium reaction. The experimental results strongly suggested the presence of SiF 4 and [SiF 6 ·SiF 4 ] 2- in H 2 SiF 6 solution. These species were estimated to be involved in the LPD process as intermediates and important for controlling the deposition process of metal oxide.