Production of Extreme Ultraviolet (EUV) Quality Silicon Carbide (SiC) Aspheric Optics
2008
L-3 Communications, SSG-Tinsley reports the optical performance demonstrated with an EUV quality aspheric mirror.
The off axis ellipsoidal reflector demonstrates a surface figure of < 3 nm RMS and a surface finish which ranges from 3 - 7 Angstroms RMS depending on the spatial period of interest. Interferometric data is provided along with surface
roughness results obtained with phase measuring microscopy. The capability to produce high quality SiC aspheric
optics, combined with the inherent thermal stability associated with SiC, enables a number of advanced mission
concepts, including next generation solar observing.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
4
Citations
NaN
KQI