4-Point-Bending Characterization of Interfacial Adhesion Strength of Co-Zr-Ta and Co-Zr-Ta Variant Thin-Film Stacks

In this study, soft magnetic thin films including Co-Zr-Ta (CZT) and its variant are deposited on TEOS SiO2 and polyimide to characterize the interfacial adhesion strength of the full magnetic stack using the 4-Point-Bending (4PB) technique. Variation in critical load value Gc, an indicator of the interfacial adhesion strength, is observed. Auger Electron Spectroscopy (AES) is performed for elemental analysis to confirm the interface of de-lamination.