Electrical characteristics of proton-irradiated Sc2O3 passivated AlGaN/GaN high electron mobility transistors
2003
Sc2O3-passivated AlGaN/GaN high electron mobility transistors (HEMTs) were irradiated with 40 MeV protons to a fluence corresponding to approximately 10 years in low-earth orbit (5×109 cm−2). Devices with an AlGaN cap layer showed less degradation in dc characteristics than comparable GaN-cap devices, consistent with differences in average band energy. The changes in device performance could be attributed completely to bulk trapping effects, demonstrating that the effectiveness of the Sc2O3 layers in passivating surface states in the drain-source region was undiminished by the proton irradiation. Sc2O3-passivated AlGaN/HEMTs appear to be attractive candidates for space and terrestrial applications where resistance to high fluxes of ionizing radiation is a criteria.
Keywords:
- Electron mobility
- Ionizing radiation
- Surface states
- Induced high electron mobility transistor
- Wide-bandgap semiconductor
- Proton
- Analytical chemistry
- Electrical resistivity and conductivity
- Physics
- Nuclear magnetic resonance
- High-electron-mobility transistor
- Optoelectronics
- Fluence
- Irradiation
- Passivation
- Semiconductor
- Correction
- Source
- Cite
- Save
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