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80 nm High Performance CMOSFET with Low Gate Leakage Current Using Conventional Thin Gate Nitric Oxide
80 nm High Performance CMOSFET with Low Gate Leakage Current Using Conventional Thin Gate Nitric Oxide
2001
K. Ota
H. Sayama
Hidekazu Oda
Yasuo Inoue
M. Inuishi H. Nakaoka
K. Nakanishi
G. Fuse
A. Kajiya
M. Ogura
Keywords:
Nanotechnology
Leakage (electronics)
Nitric oxide
Analytical chemistry
Materials science
gate leakage current
Correction
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