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Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants
Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants
2021
Nithin Poonkottil
Matthias Minjauw
Andreas Werbrouck
Christophe Detavernier
Jolien Dendooven
Keywords:
Chemical engineering
Thin film
Atomic layer deposition
Ruthenium dioxide
Materials science
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