Film-forming composition including fluorine-containing surfactant

[Problem] To provide a coating and a formation method therefor, the periphery of the coating having a reduced amount the edge pooling that generates unnecessary residuum that even etching does not eliminate. [Solution] A film-forming composition that is for lithography and that includes a surfactant that includes a polymer and an oligomer that have a perfluoroalkyl substructure that has 3-5 carbons. A favorable number of carbons for the perfluoroalkyl substructure is 4. The perfluoroalkyl substructure may also include an alkyl substructure, and a (meta)acrylate polymer and oligomer are favorable for the polymer and the oligomer. The surfactant is 0.0001-1.5 mass% of the solid content of the film-forming composition. The film-forming composition also includes a coating film resin that is a novolac resin, a condensed epoxy resin, a (meta)acrylic resin, a polyether resin, a silicon-containing resin, or the like. The film that is formed can be used as an underlayer film for a resist or an overlayer film for a resist.