Old Web
English
Sign In
Acemap
>
Paper
>
Next Generation STI Slurries and Chemical Endpoint for 45 nm Node Technology
Next Generation STI Slurries and Chemical Endpoint for 45 nm Node Technology
2006
Brian L. Mueller
Patrick Flanagan
Sarah J. Lane
Scott Lawing
Kerry Lindemann
Keywords:
Nanotechnology
Slurry
Materials science
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]