Mo Conductor Forming Technique with Laser Chemical Vapor Deposition (CVD)

A reduction in resistivity and an improvement in reliability of Mo conductors formed by laser CVD from Mo(CO)6 gas have been achieved using laser annealing. By establishing a standard of 10 μ Ω • cm, the reduction in resistivity was analyzed by AES (Auger Electron Spectrometry) and XRD (X‐ray Diffractometry) methods. Reliability has been confirmed by the stability of resistance when subjected to a heat cycle of −50 – 150°C for more than 70 times.