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GaAs Surface Chemistry and Surface Damage in a Cl_2/Ar High Density Plasma Etching Process
GaAs Surface Chemistry and Surface Damage in a Cl_2/Ar High Density Plasma Etching Process
1996
C. R. Eddy
Orest J. Glembocki
D. Leonhardt
V. A. Shamamian
Ronald T. Holm
James E. Butler
S. W. Pang
Keywords:
Analytical chemistry
high density
Chemistry
Plasma etching
Correction
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