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Properties of ECR-PECVD hydrogenated amorphous silicon nitride films for passivation purpose
Properties of ECR-PECVD hydrogenated amorphous silicon nitride films for passivation purpose
2005
H. Charifi
A. Zerga
A. Slaoui
J.C. Muller
J.P. Stoquert
Keywords:
Plasma-enhanced chemical vapor deposition
Amorphous silicon
Passivation
Inorganic chemistry
Nitride
Materials science
Optoelectronics
amorphous silicon nitride
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